The cleaning of process media is an element of clean processing. The level of cleanliness of process media depends on a multitude of potential contamination sources. This part of the guideline VDI 2083 primarily assesses the influence of particulate contamination. Particulate contamination of products manufactured in clean rooms is not subject of this guideline.
VDI 2083 Blatt 7-2006 Referenced Document
DIN 50450-1:1987 Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of water impurity in hydrogen, oxygen, nitrogen, argon and helium by using a diphosphorus pentoxide cell
DIN 50450-2:1991 Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N<(Index)2>, Ar, He, Ne and H<(Index)2> by using a galvanic cell
DIN 50450-3:1991 Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of methane impurity in H<(Index)2>, O<(Index)2>, N<(Index)2>, Ar and He by using a flame ionization detector (FID)
DIN 50452-1:1995 Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 1: Microscopic determination of particles
DIN 50452-2:1991 Testing of materials for semiconductor technology; test method for particle analysis in liquids; determination of particles with optical particle counters
DIN 58356-12:2000 Filter elements - Membrane filter elements - Part 12: Integrity test of hydrophobic membrane filters with water
DIN 58356-2:2000 Membrane filter elements - Part 2: Pressure holder tests