ASTM F154-02 PDF

Scope: Full Description This standard was transferred to SEMI (www.semi.org) May 20031.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .

ASTM F154-02 Referenced Document

ASTM F1241
ASTM F1725 Standard Guide for Analysis of Crystallographic Perfection of Silicon Ingots*， 1997-04-20 Update
ASTM F1726 Standard Guide for Analyis of Crystallographic Perfection of Silicon Wafers*， 1997-04-20 Update
ASTM F1727 Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers*， 1997-04-20 Update
ASTM F1809 Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon*， 1997-04-20 Update
ASTM F1810
ASTM F523 Standard Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces*， 1993-04-20 Update

1970 ASTM F154-02
2000 ASTM F154-00 Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces