These specifications cover the general requirements for pellicles used as a protection on photomasks. The specifications widely correspond to the standardizations prepared by SEMI (Semiconductor Equipment and Materials Institute) in the USA. Applications using deep-UV-exposure (wayelength <=360 nm) are not yet taken into account.
VDI/VDE 3717 Blatt 6-1999 Referenced Document
VDI 2083 Blatt 1-1995 Reinraumtechnik - Grundlagen@ Definitionen und Festlegungen der Reinheitsklassen