DS/EN 62047-14:2012
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials

Standard No.

DS/EN 62047-14:2012

Release Date

2012

Published By

Danish Standards Foundation

Latest

DS/EN 62047-14:2012

Scope

IEC 62047-14:2012 describes definitions and procedures for measuring the forming limit of metallic film materials with a thickness range from 0,5 μm to 300 μm. The metallic film materials described herein are typically used in electric components, MEMS an

DS/EN 62047-14:2012 history

• 2012 DS/EN 62047-14:2012 Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials