ASTM F1524-95(2013)
Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills

Standard No.
ASTM F1524-95(2013)
Release Date
1995
Published By
American Society for Testing and Materials (ASTM)
Status
Replace By
ASTM F1524-22
Latest
ASTM F1524-22
Scope

3.1 General—This guide contains information regarding the use of AOPs to oxidize and eventually mineralize hazardous materials that have entered surface and groundwater as the result of a spill. Since much of this technology development is still at the benchscale level, these guidelines will only refer to those units that are currently applied at a field scale level.

3.2 Oxidizing Agents:

3.2.1 Hydroxyl Radical (OH)—The OH radical is the most common oxidizing agent employed by this technology due to its powerful oxidizing ability. When compared to other oxidants such as molecular ozone, hydrogen peroxide, or hypochlorite, its rate of attack is commonly much faster. In fact, it is typically one million (106) to one billion (109) times faster than the corresponding attack with molecular ozone (1).2 The three most common methods for generating the hydroxyl radical are described in the following equations:

Equation F1524-95R13_1


Equation F1524-95R13_2


Equation F1524-95R13_3

3.2.1.1 Hydrogen peroxide is the preferred oxidant for photolytic oxidation systems since ozone will encourage the air stripping of solutions containing volatile organics (2) . Capital and operating costs are also taken into account when a decision on the choice of oxidant is made.

3.2.1.2 Advanced oxidation technology has also been developed based on the anatase form of titanium dioxide. This method by which the photocatalytic process generates hydroxyl radicals is described in the following equations:

Equation F1524-95R13_4


Equation F1524-95R13_5

3.2.2 Photolysis—Destruction pathways, besides the hydroxyl radical attack, are very important for the more refractory compounds such as chloroform, carbon tetrachloride, trichloroethane, and other chlorinated methane or ethane compounds. A photoreactor's ability to destroy these compounds photochemically will depend on its output level at specific wavelengths. Since most of these lamps are proprietary, preliminary benchscale testing becomes crucial when dealing with these compounds.

3.3 AOP Treatment Techniques:

3.3.1 Advanced oxidation processes (AOPs) may be applied alone or in conjunction with other treatment techniques as follows:

3.3.1.1 Following a ......

ASTM F1524-95(2013) history

  • 2022 ASTM F1524-22 Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills
  • 1995 ASTM F1524-95(2013) Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills
  • 1995 ASTM F1524-95(2007) Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills
  • 1995 ASTM F1524-95(2001) Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills
  • 1995 ASTM F1524-95 Standard Guide for Use of Advanced Oxidation Process for the Mitigation of Chemical Spills
Standard Guide for  Use of Advanced Oxidation Process for the Mitigation of Chemical  Spills



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