YS/T 839-2012
Test method for measurement of insulator thickness and refractive index on silicon substrates by ellipsometry (English Version)
- Standard No.
- YS/T 839-2012
- Language
- Chinese, Available in English version
- Release Date
- 2012
- Published By
- Professional Standard - Non-ferrous Metal
- Latest
- YS/T 839-2012
- Scope
- This method specifies the method for measuring the thickness and refractive index of insulator films grown or deposited on silicon substrates using elliptical polarization testing. This method is suitable for measuring the thickness and refractive index of insulator films where the film has no absorption of the test wavelength and the substrate is opaque to the test wavelength, and the refractive index and extinction coefficient of the substrate at the test wavelength are known. For non-insulating films, this method can be used only when certain conditions are met.
YS/T 839-2012 history
- 2012 YS/T 839-2012 Test method for measurement of insulator thickness and refractive index on silicon substrates by ellipsometry
