This guideline deals with reflective X-ray optical systems, which use total reflection as well as Bragg reflection on inner interfaces of a multilayer structure to influence the spectral composition and the directional characteristic. The physical principles and determining parameters of these X-ray mirrors are described. The role and influence of substrate and coatings are explained. Total reflection mirrors and multilayer mirrors for various applications are discussed. The most important X-ray optical systems using X-ray mirrors (Kirkpatrick-Baez, Wolter, Schwarzschild, Montel und EUVL optics) are introduced briefly.
VDI/VDE 5575 Blatt 4-2011 Referenced Document
DIN EN ISO 11145:2008 Optics and photonics - Lasers and laser-related equipment - Vocabulary and symbols (ISO 11145:2006); English version of DIN EN ISO 11145:2008-11
DIN EN ISO 13694:2000 Optics and optical instruments - Lasers and laser-related equipment - Test methods for laser beam power (energy) density distribution (ISO 13694:2000); German version EN ISO 13694:2000
VDI 1000-2010 VDI Guideline Work - Principles and procedures