ANSI/NFPA 318-2011
Standard for the Protection of Semiconductor Fabrication Facilities

Standard No.

ANSI/NFPA 318-2011

Release Date

2011

Published By

American National Standards Institute （ANSI)

Latest

ANSI/NFPA 318-2011

Scope

1.1 Scope. This standard applies to semiconductor fabrication facilities and comparable fabrication processes, including research and development areas in which hazardous chemicals are used, stored, and handled and containing what is herein defined as a cleanroom or clean zone, or both.

ANSI/NFPA 318-2011 history

• 2011 ANSI/NFPA 318-2011 Standard for the Protection of Semiconductor Fabrication Facilities