ASTM F1513-99(2003)
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications

Standard No.

ASTM F1513-99(2003)

Release Date

1999

Published By

American Society for Testing and Materials (ASTM)

Status

Be replaced

Replace By

ASTM F1513-99(2011)

Latest

ASTM F1513-99(2011)

Scope

1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).

1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.

1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

ASTM F1513-99(2003) history

• 1999 ASTM F1513-99(2011) Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
• 1999 ASTM F1513-99(2003) Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
• 1999 ASTM F1513-99 Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications