ASTM F1261M-96(2003)
Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]

Standard No.

ASTM F1261M-96(2003)

Release Date

1996

Published By

American Society for Testing and Materials (ASTM)

Status

Withdraw 2009-05

Latest

ASTM F1261M-96(2003)

Scope

1.1 This test method is designed for determining the average electrical width of a narrow thin-film metallization line.

1.2 This test method is intended for measuring thin metallization lines such as are used in microelectronic circuits where the width of the lines may range from micrometres to tenths of micrometres.

1.3 The test structure used in this test method may be measured while still part of a wafer, or part therefrom, or as part of a test chip bonded to a package and electrically accessible by means of package terminals.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM F1261M-96(2003) Referenced Document

• ASTM E178 Standard Practice for Dealing With Outlying Observations

ASTM F1261M-96(2003) history

• 1996 ASTM F1261M-96(2003) Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]
• 1996 ASTM F1261M-96 Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]