DIN 50451-2:2003
Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectros

Standard No.
DIN 50451-2:2003
Release Date
2003
Published By
German Institute for Standardization
Status
Replace By
DIN 50451-2:2003-04
Latest
DIN 50451-2:2003-04
Replace
DIN 50451-2:1990 DIN 50451-2:2002
Scope
The document specifies a method for testing hydrofluoric acid for the metal traces of cobalt (Co), chromium (Cr), copper (Cu), iron (Fe), and nickel (Ni) relevant to semiconductor technology. Emission spectroscopy with plasma excitation (for example, inductively coupled plasma (ICP) or direct current plasma (DCP)) is used for the determination. The range of application covers trace element mass fractions from 1 ng/g to 1000 ng/g.#,,#

DIN 50451-2:2003 history

  • 2003 DIN 50451-2:2003-04 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spect...
  • 2003 DIN 50451-2:2003 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectros
  • 0000 DIN 50451-2:2002
  • 0000 DIN 50451-2:1990
Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectros



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