GB/T 17866-1999
Guideline for programmed defect masks and benchmark procedures for sensitivity analysis of mask defect inspection systems (English Version)
- Standard No.
- GB/T 17866-1999
- Language
- Chinese, Available in English version
- Release Date
- 1999
- Published By
- General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
- Latest
- GB/T 17866-1999
- Scope
- The purpose of this standard is to develop a set of test masks that can be used to evaluate the sensitivity of mask defect inspection systems. This set of test masks includes: a test chip with custom pattern defects and a reference test chip without custom pattern defects. Since the test chip is composed of various units, in this standard, the test chip is defined by the pattern of the cells, the specially made defects in the pattern of the cells, and the layout of the cells. Furthermore, the test mask is defined by specifying the arrangement of the test chips. This standard also describes the use of this set of masks. In the sensitivity test of equipment in the past, many equipment manufacturers and users used different masks, and each manufacturer and user decided on different test methods. In some cases, there is no harmonized measurement method or sensitivity analysis method as yet. Therefore, when comparing the sensitivity of equipment from various manufacturers, when manufacturers and users agree on specifications, and when users and users agree on specifications, confusion will inevitably occur. Therefore, when evaluating the sensitivity of the mask defect inspection system, it is better to use the test mask specified in this standard.
GB/T 17866-1999 history
- 1999 GB/T 17866-1999 Guideline for programmed defect masks and benchmark procedures for sensitivity analysis of mask defect inspection systems
