GB/T 16878-1997 (English Version) PDF

Standard No.: GB/T 16878-1997
Language: Chinese, Available in English version
Release Date: 1997
Published By: General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
Latest: GB/T 16878-1997

Scope: This specification specifies several standard test patterns for the consistent and comprehensive evaluation and testing of micrographic equipment, metrology instruments and processes used in the production of integrated circuits. This specification specifies the shape, general size, and recommended layout and design rules of several basic test pattern units for the needs of line width measurement, resolution test and proximity effect test. These standard patterns include various pattern elements available for optical microscope, electron microscope, and electron probe measurements. This specification does not specify the measurement technology for verifying the critical dimensions of the test pattern on the master, nor does it specify how to measure the photolithographic pattern on the wafer. It only specifies several necessary basic test patterns and the actual test pattern that the user implements in accordance with this specification.

GB/T 16878-1997 history

1997 GB/T 16878-1997 Specification for metrology pattern cells for integrated circuit manufacture