DIN 50438-1:1995 Testing of materials for semiconductor technology - Determination of impurity content in silicon by infrared absorption - Part 1: Oxygen
This document specifies two methods for the non-destructive determination of the oxygen content in silicon by infrared absorption.
DIN 50438-1:1995 history
1995DIN 50438-1:1995 Testing of materials for semiconductor technology - Determination of impurity content in silicon by infrared absorption - Part 1: Oxygen