ISO 22197-3:2019 PDF

Scope: This document specifies a test method for the determination of the air-purification performance of materials that contain a photocatalyst or have photocatalytic films on the surface, usually made from semiconducting metal oxides, such as titanium dioxide or other ceramic materials, by continuous exposure of a test piece to the model air pollutant under irradiation with ultraviolet light (UV-A). This document is intended for use with different kinds of materials, such as construction materials in flat sheet, board or plate shape, that are the basic forms of materials for various applications. This document also applies to structured filter materials including honeycomb-form, woven and non- woven fabrics, and to plastic or paper materials if they contain ceramic microcrystals and composites. This document does not apply to powder or granular photocatalytic materials. This test method is usually applicable to photocatalytic materials produced for air purification. This method is not suitable for the determination of other performance attributes of photocatalytic materials, i.e. decomposition of water contaminants, self-cleaning, antifogging and antibacterial actions. It concerns the removal of toluene.

ISO 22197-3:2019 Referenced Document

ISO 10677 Fine ceramics (advanced ceramics, advanced technical ceramics) - Ultraviolet light source for testing semiconducting photocatalytic materials
ISO 4892-3 Plastics - Methods of exposure to laboratory light sources - Part 3: Fluorescent UV lamps
ISO 80000-1 Quantities and units - Part 1: General*， 2022-12-06 Update
ISO/IEC 17025 General requirements for the competence of testing and calibration laboratories [Standard in French]

2019 ISO 22197-3:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for air-purification performance of semiconducting photocatalytic materials — Part 3: Removal of toluene
2011 ISO 22197-3:2011 Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for air-purification performance of semiconducting photocatalytic materials - Part 3: Removal of toluene