BS ISO 22415:2019
Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
- Standard No.
- BS ISO 22415:2019
- Release Date
- 2019
- Published By
- British Standards Institution (BSI)
- Latest
- BS ISO 22415:2019
- Scope
- What is ISO 22415 about? ISO 22415 specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1000 nanometres on a flat substrate that has a different chemical composition to the specified material. ISO 22415 is applicable to test samples in which the specified material layer has a homogeneous composition in-depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. ISO 22415 is applicable to instruments in which the ...
BS ISO 22415:2019 history
- 2019 BS ISO 22415:2019 Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
