ASTM F1709-97(2016)
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- Standard No.
- ASTM F1709-97(2016)
- Release Date
- 2016
- Published By
- American Society for Testing and Materials (ASTM)
- Latest
- ASTM F1709-97(2016)
- Scope
- 1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices. 1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
ASTM F1709-97(2016) Referenced Document
- ASTM E112 Standard Test Methods for Determining Average Grain Size
ASTM F1709-97(2016) history
- 2016 ASTM F1709-97(2016) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- 1997 ASTM F1709-97(2008) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- 1997 ASTM F1709-97(2002) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- 1996 ASTM F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
