This standard specifies the basic requirements, technical requirements, test methods, inspection rules, marking, packaging, transportation, storage and safety requirements and quality commitments of 7N photoelectronic grade ultrapure ammonia. The product ammonia specified in this standard is suitable for the semiconductor industry, chemical vapor deposition of silicon nitride and gallium nitride, and can also be used for ammonia used in production processes such as the nitridation of silicon or silicon oxide. Molecular formula: NH3. Relative molecular mass: 17.031 (according to 2016 international relative atomic weight).
T/ZZB 1373-2019 history
2019T/ZZB 1373-2019 7N photoelectric class hyperpure ammonia