GB/T 42106-2022 Nanotechnology—Fabrication of three dimensional nanostructures and devices—A strain method induced by ion beam irradiation (English Version)
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
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GB/T 42106-2022
Scope
This document describes the processing method of ion beam irradiation-induced strain technology to construct three-dimensional nanostructures and devices, mainly including processing principles, materials and equipment, environmental conditions, and processing methods. This document is suitable for ion beam irradiation to induce spatial strain of vertical nanowires and planar nanofilms, and then realize three-dimensional nanostructures and devices composed of one-dimensional nanowires and two-dimensional nanofilms in three-dimensional space.
GB/T 42106-2022 Referenced Document
GB/T 6682 Water for analytical laboratory use.Specification and test methods
GB/T 42106-2022 history
2022GB/T 42106-2022 Nanotechnology—Fabrication of three dimensional nanostructures and devices—A strain method induced by ion beam irradiation