1 Scope
This document gives guidance and requirements on the optimization of sputter-depth
profiling parameters using appropriate single-layered and multilayered reference materials,
in order to achieve optimum depth resolution as a function of instrument settings
in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion
mass spectrometry.
This document is not intended to cover the use of special multilayered systems such
as delta doped layers.
BS ISO 14606:2022 history
2023BS ISO 14606:2022 Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials
2015BS ISO 14606:2015 Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials
2001BS ISO 14606:2000 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials