ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
- Standard No.
- ISO 21859:2019
- Release Date
- 2019
- Published By
- International Organization for Standardization (ISO)
- Latest
- ISO 21859:2019
- Scope
- This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
ISO 21859:2019 Referenced Document
- ISO 18452 Fine ceramics (advanced ceramics, advanced technical ceramics) - Determination of thickness of ceramic films by contact-probe profilometer
- ISO 3274 Geometrical Product Specifications (GPS) - Surface texture: Profile method - Nominal characteristics of contact (stylus) instruments; Technical Corrigendum 1
- ISO 4287 Geometrical product specifications (GPS) — Surface finish: Profile method — Surface finish terms, definitions and parameters — Amendment 2: .
ISO 21859:2019 history
- 2019 ISO 21859:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
