This standard specifies the X-ray diffraction measurement principle, measurement procedures, result calculation and accuracy of gallium arsenide and indium phosphide single crystal ingot end surfaces and wafer crystal orientation. This standard is applicable to the determination of crystal orientation of single crystal wafers whose surface is generally parallel (within 10^(·)) to a certain low Miller index atomic plane.
SJ 3244.3-1989 history
1989SJ 3244.3-1989 Methods of measurement for crystal-orientation of single crystal of Gallium arsenide and Indium phosphide